Product Overview
DM-8000 microwave plasma CVD equipment
The DM-8000 microwave plasma CVD equipment can provide a maximum 70mm diamond production capacity, and achieve stable batch output with high efficiency and unmanned management.
Performance Characteristics
* cleanning vacuum system
* fully imported gas supply system
* Sample cooling system designed with Duel-Loop
* Automated process growth control system
* ON-line visual inspection function
Suitable for the deposition of optical, electronic, tool grade diamond film or single crystal, graphene, etc., material surface treatment, low temperature oxide growth, etc.
Technical Index
| （1） | model | DM-8000 |
| （2） | power suply | 380VAC±5%/50Hz, three-phase five-wire |
| （3） | Microwave power | 8kW ，2450MHz |
| （4） | Microwave leakage | ≤2mW/cm³@5cm |
| （5） | Power stability | better than ±1% (@ Steady state ) |
| （6） | Effective deposition area | up to Φ 70 mm |
| （7） | Sample stage diameter | Φ120 mm |
| （8） | Ultimate vacuum degree | ≤5 ×1 0-1 P a |
| （9） | Vacuum leak rate | ＜1x10-9Pa.m³/s |
| （10） | Single crystal growth | growth rate 10-15μm/H, single-round growth thickness ≥1.6mm |
| （11） | Single crystal quality | H color and better, flawless to the naked eye |
| （12） | Gas channels | Standard MFC: H : 1000sccm, CH : 100sccm, O : 10sccm, N : 5ccm; can be extendable to 5 channels |
| （13） | Pressure control range | 5-255 torr |
| （14） | Pressure control accuracy | ±0 . 1 T o r r |
| （15） | Cooling water | ＞65L/Min |
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