HMPS-2150SP Microwave Plasma CVD Equipment
Chengdu Newman-Hueray Microwave Technology Co., Ltd. is a high-tech enterprise with independent intellectual property rights, specializing in the research and development of microwave energy and microwave plasma application technologies, as well as the production of related equipment. The company has 22 years of experience in dedicated research on microwave plasma MPCVD systems. Up to now, it has provided hundreds of MPCVD devices to customers at home and abroad. By virtue of the excellent performance of its products and high-quality services, the company has gained extensive recognition and praise from users.
The HMPS-2150SP microwave plasma MPCVD system features fast deposition rates, high deposition quality, and a deposition area exceeding 100mm. It is suitable for the deposition of optical, electronic, tool-grade diamond films, single crystals, graphene, and other materials, as well as surface treatment of materials and the growth of low-temperature oxides.
◆The microwave reaction chamber adopts a new-generation volumetric hinged butterfly-shaped cavity with high power density and high power handling capability.
◆TM02 dual-mode spot deposition, with a spot deposition area diameter of up to 100 mm and a uniform deposition area diameter of ≥90 mm.
◆High-power, high-stability solid-state microwave power source with excellent microwave power output stability.
◆The plasma is kept away from the quartz window, which uses natural convection cooling.
◆18 L/s double-stage rotary vacuum pump or molecular pump (optional).
◆Advanced performance, high safety and reliability, excellent reproducibility, and easy operation.
◆Real-time monitoring, data acquisition, and recording of multiple parameters, PLC screen control, and multiple interlock protection and alarm functions.
| （1） | Model | HMPS-2150SP |
| （2） | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA |
| （3） | Microwave output power | 0.5~15kW continuously adjustable |
| （4） | Power stability | ≤±50ppm |
| （5） | reaction chamber | double-layer water -cooled stainless steel |
| （6） | Microwave frequency | 2450MHz±50MHz |
| （7） | Temperature measurement system | infrared 300~1400℃ single color or double color 600-1800℃ |
| （8） | Ultimate vacuum degree | 6×10-6torr |
| （9） | Working pressure | 8torr~220torr,±0.1Torr |
| （10） | oxygen-free copper water cooling Sample stage | Φ220mm |
| （11） | molybdenum sample stage ： | Φ≥90mm |
| （12） | Working atmosphere | Five-way (customizable) |
| （13） | Microwave leakage value | ＜5mW/cm2 |
| （14） | Working environment temperature | 15-40℃, relative humidity ≤60%, no corrosive gas |
| （15） | Cooling water | ＞22L/Min |
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