HMPS-9750S Microwave Plasma CVD Equipment
Chengdu Newman-Hueray Microwave Technology Co., Ltd. is a high-tech enterprise with independent intellectual property rights, specializing in the research and development of microwave energy and microwave plasma application technologies, as well as the production of related equipment. The company has 22 years of experience in dedicated research on microwave plasma MPCVD systems. Up to now, it has provided hundreds of MPCVD devices to customers at home and abroad. Relying on the excellent performance of its products and high-quality services, the company has won extensive recognition and praise from users.
The HMPS-9750S microwave plasma MPCVD system boasts a fast deposition rate, high deposition quality, and a deposition area exceeding 6 inches. It is suitable for the mass growth of high-quality nanocrystalline and ultra-fine nanocrystalline diamonds, as well as optical-grade diamond windows of 6 inches and above. Additionally, it is applicable to the CVD preparation of various thin films, material surface treatment and modification, the growth of low-temperature oxides, etc.
◆ Innovative design of the microwave reaction chamber, featuring a new generation of large-capacity bottom-fed large-ring-shaped working cavity, capable of handling ultra-high microwave power capacity with high power density.
◆ Independently developed with proprietary intellectual property rights, featuring precise design and simulation.
◆ High-power solid-state microwave source or switch-type microwave power source, ensuring high stability of microwave power output.
◆Imported high-precision MFC, high-reliability and stable pressure control system.
◆Advanced performance, safe, reliable, and reproducible, with simple operation.
◆Real-time monitoring, data collection, and recording of multiple parameters, PLC screen control, and multiple interlock protection and alarm systems.
| （1） | Model | HMPS-9750S |
| （2） | Power supply | 380V，3-phase 5-wire |
| （3） | Microwave output power | 5~75kW continuously adjustable |
| （4） | Power stability | ≤±2%（@full power） |
| （5） | Ripple | ≤1% |
| （6） | Microwave frequency | 915MHz±15MHz |
| （7） | Temperature measurement method | 300℃-1400℃ single color or double color 475-1475℃ |
| （8） | Ultimate vacuum degree | ≤6×10-6torr |
| （9） | Working pressure | 8torr~220torr，±0.1torr |
| （10） | Pressure rise rate | ≤ 1 Pa/h（24h average） |
| （11） | Plasma discharge area | Φ≥240mm |
| （12） | molybdenum sample stage | Φ≥200mm |
| （13） | Working gas | 5-way (user customisable) |
| （14） | Vacuum leakage rate | ≤5×10-10pa.m³/s（He） |
| （15） | Working environment | Temperature 15~40℃, relative humidity ≤60%, no corrosive gas |
| （16） | Cooling water | ＞210L/Min |
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