HMPS-9750S Microwave Plasma CVD Equipment
Chengdu Newman-Hueray Microwave Technology Co., Ltd. is a high-tech enterprise specialising in the research and development of microwave energy, microwave plasma application technology and its equipment production with independent intellectual property rights. In recent years, the company has been for the Chinese Academy of Sciences, the Institute of Materials, Jilin University, Nanjing University, Sichuan University, Ningbo Crystal Diamond Company, Beijing Wold Company and other research institutes, well-known enterprises and foreign customers to provide nearly one hundred sets of MPCVD equipment, by virtue of the excellent performance of the products and high-quality service, the company has been widely recognised by the user and praise.
◆New design of microwave reaction chamber with high power density.
◆Fast product deposition rate, high deposition quality, deposition area over 6inch.
◆ Switching microwave power source, high stability of microwave power output.
◆ Suitable for optics, electronics, tool grade diamond film or single crystal, graphene etc. deposition, material surface treatment, low temperature oxide growth etc.
◆Advanced performance, safety, high reliability, good reproducibility, easy operation.
◆Multi-parameter real-time monitoring, acquisition and recording, PLC screen control, multiple interlock protection and alarm.
(1) | Model | HMPS-9750S |
(2) | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <150KVA |
(3) | Microwave output power | 5~75kW continuously adjustable |
(4) | Power stability | ≤±2%(@full power) |
(5) | Ripple | ≤1% |
(6) | Microwave frequency | 915MHz±15MHz |
(7) | Temperature measurement method | Infrared dual wavelength475-1475℃ |
(8) | Ultimate vacuum degree | 6×10-6torr |
(9) | Working pressure | 7torr~250torr |
(10) | Automatic air pressure control | ±0.1torr |
(11) | Plasma discharge area | Φ≥125mm |
(12) | Effective deposition area | Φ≥100mm |
(13) | Working gas | 5-way (user customisable) |
(14) | Microwave leakage values | <5mW/cm2 |
(15) | Working environment | Temperature 15~40℃, relative humidity ≤60%, no corrosive gas |
(16) | Cooling water | >210L/Min |
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