HMPS-2060SP Microwave Plasma (CVD) System
Chengdu Newman-Hueray Microwave Technology Co., Ltd. is a high-tech enterprise with independent intellectual property rights, specializing in the research and development of microwave energy and microwave plasma application technologies, as well as the production of related equipment. The company has 22 years of experience in dedicated research on microwave plasma MPCVD systems. Up to now, it has provided hundreds of MPCVD devices to customers at home and abroad. By virtue of the excellent performance of its products and high-quality services, the company has gained extensive recognition and praise from users.
The HMPS-2060SP microwave plasma MPCVD system features fast deposition rates, high deposition quality, and a deposition area exceeding 60mm. It is suitable for the deposition of optical, electronic, tool-grade diamond films, single crystals, graphene, and other materials, as well as surface treatment of materials and the growth of low-temperature oxides.
◆ Independently developed with proprietary intellectual property rights.
◆ Imported high-precision MFC, high-reliability and stable pressure control system.
◆ Third-generation high-stability solid-state power source; top-fed cylindrical discharge chamber;
◆ Multi-level adjustment, programmable lifting of sample stage and chamber plate.
◆ Advanced performance, safe, highly reliable, good reproducibility, and easy to operate.
◆Real-time monitoring, data acquisition, and recording of multiple parameters; PLC screen control; multiple interlock protection mechanisms.
| （1） | Model | HMPS-2060SP |
| （2） | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA |
| （3） | Microwave output power | 0.5~6kW continuously adjustable |
| （4） | Power stability | ＜±50ppm |
| （5） | Ripple | ≤1% |
| （6） | Microwave frequency | 2450MHz±50MHz |
| （7） | Temperature measurement system | 300~1400℃ single color or double color 600~1800℃ |
| （8） | Ultimate vacuum degree | ≤3.7x10-3Torr or ≤6x10-6Torr(molecular pump) |
| （9） | Working pressure | 5torr~226torr,±0.1 Torr |
| （10） | discharge zone | Φ60mm |
| （11） | the area of uniform deposition | Φ50mm |
| （12） | Working atmosphere | H₂/CH₄/N₂/O₂ (CO₂Ar is available)，can be extended |
| （13） | Microwave leakage value | ＜5mW/cm2 |
| （14） | Working environment temperature | 15-40℃, relative humidity ≤60%, no corrosive gas |
| （15） | Cooling water | ＞22L/Min |
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