HMPS-2080SP Microwave Plasma CVD Equipment
Chengdu Newman-Hueray Microwave Technology Co., Ltd. is a high-tech enterprise with independent intellectual property rights, specializing in the research and development of microwave energy and microwave plasma application technologies, as well as the production of related equipment. The company has 22 years of experience in dedicated research on microwave plasma MPCVD systems. Up to now, it has provided hundreds of MPCVD devices to customers at home and abroad. By virtue of the excellent performance of its products and high-quality services, the company has gained extensive recognition and praise from users.
The HMPS-2080SP microwave plasma MPCVD system features fast deposition rates, high deposition quality, and a deposition area exceeding 70mm. It is suitable for the deposition of optical, electronic, tool-grade diamond films, single crystals, graphene, and other materials, as well as surface treatment of materials and the growth of low-temperature oxides.
◆The microwave reaction chamber adopts a new-generation volumetric cylindrical chamber with high power density and high power handling capability.
◆The discharge area diameter can reach 70 mm, and the uniform deposition area diameter is ≥68 mm.
◆High-power, high-stability solid-state microwave power source with high stability in microwave power output.
◆Imported high-precision MFC with a reliable pressure control system.
◆8 L/s two-stage rotary vane vacuum pump or molecular pump (optional).
◆Advanced performance, safe, reliable, and reproducible, with simple operation.
◆Real-time monitoring, data collection, and recording of multiple parameters, PLC screen control, and multiple interlock protection and alarm functions.
| （1） | Model | HMPS-2080SP |
| （2） | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA |
| （3） | Microwave output power | 0.5~8kW continuously adjustable |
| （4） | Power stability | better than 1% |
| （5） | Ripple | ≤1% |
| （6） | Microwave frequency | 2450MHz±50MHz |
| （7） | Temperature measurement method | infrared 300~1400℃ |
| （8） | Ultimate vacuum | ≤3.7×10-3Torr |
| （9） | Working pressure | 5torr~225torr |
| （10） | Discharge zone | Φ≥70mm |
| （11） | uniform deposition zone | ≥68mm |
| （12） | Working atmosphere | H2 /CH4 /N2 /O2 or CO2 or Ar, expandable to 5 channels |
| （13） | Helium mass spectrometry vacuum leakage rate | ≤1.0×10-9Pa·m3/s； |
| （14） | Working environment temperature | 15-40℃, relative humidity ≤60%, no corrosive gas |
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