The HUERAY MPCVD equipment process generally consists of the following steps.

The HUERAY  MPCVD equipment process generally includes the following steps.

1. Equipment preparation: Firstly, the MPCVD equipment needs to be cleaned and inspected to ensure that all components are functioning properly. Then, the substrate to be deposited is placed in the reaction chamber and vacuum pumped to ensure the purity of the reaction environment.

2 . Gas supply: According to the deposition requirements of the desired material, select the appropriate combination of gases. Commonly used gases include ammonia, aminosilane, methyltrihydrosilane, and so on. These gases are fed into the reaction chamber through the gas supply system.

3 . Plasma excitation: Through the high frequency electromagnetic wave generated by the microwave generator, the gas forms plasma in the reaction chamber. The plasma excitation excites the chemical bonds of the gas molecules, causing them to dissociate, react and recombine to form the desired material.

4 . Deposition process: In the presence of plasma, material atoms or molecules are excited and moved, eventually depositing on the surface of the substrate to form a thin film or coating. The deposition rate and film quality depend on the control of parameters such as gas flow rate, reaction temperature, and deposition time.

5 . Post-treatment: After the deposition is completed, the sample needs to be post-treated. Common post-treatment methods include annealing, ion implantation, oxidation, etc. to improve the mourning and B® properties of the tree buckets.