Microwave plasma chemical vapour deposition equipment: the first choice for growing high-quality car

As we all know, microwave plasma CVD equipment is the most commonly used CVD technology for synthesising high-quality carbon materials, and has been the hotspot and focus of research in recent years.

Plasma is a gaseous substance that contains neutral groups such as molecules and atoms, charged groups such as electrons and ions, and exhibits highly excited unstable states, but it is electrically neutral on the whole.

The basic principle of a microwave plasma CVD plant is that microwaves of a certain frequency are generated by a microwave source and transmitted through a waveguide and a mode conversion antenna into a resonant cavity and generate a stable region of high field strength directly above the deposition table. The incoming reaction gas excites a plasma in the high-field region and generates a large number of reactive groups in the plasma region, which, when diffused and adsorbed onto the substrate surface, can be deposited to produce carbon materials.

Microwave plasma CVD equipment has unique advantages over other CVD equipment. The advantages are high deposition quality, large area and easy adjustment of process parameters. Because the microwave discharge does not need electrodes or a hot wire like hot wire CVD, it avoids metal contamination and improves the quality of the deposited material; and the electric field generated by the microwave discharge is very stable, which is less uncontrollable than that of the combustion flame CVD, and it also provides a strong guarantee of the high quality of the generated carbon material.

Different methods are suitable for different situations, and it is not that microwave plasma equipment is suitable for all application environments. As a senior MPCVD equipment manufacturers - Hueray microwave that customers in the high quality requirements of carbon materials, the best choice is microwave plasma CVD equipment.