MPCVD manufacturers decipher the performance differences between different types of diamond thin fil

Many customers in the industry have a question when choosing diamond thin film deposition equipment, what exactly are the differences in performance between different types of diamond thin film deposition equipment! As a senior MPCVD equipment provider, Hueray microwave to give you a deep dive.

Let's start with hot filament chemical vapour deposition (HFCVD) equipment. Its advantage is that the equipment structure is relatively simple, low cost. But then, the deposition rate is slow, and the quality of the film may be affected by hot filament contamination.

Microwave Plasma Chemical Vapour Deposition (MPCVD) is a different story. It is capable of generating high-purity, high-energy plasma, so the quality of the deposited diamond films is quite high, with good purity and good crystallinity. However, the cost of this equipment is relatively high.

The DC Arc Plasma Jet CVD equipment has a very fast deposition rate and is suitable for mass production. However, it has the disadvantage of relatively poor film uniformity and the stability of the equipment needs to be improved to make it work.

Laser-assisted chemical vapour deposition (LCVD) equipment, on the other hand, is capable of localised and precise deposition, and is uniquely suited to the deposition of complex shapes and small sizes. However, the deposition area is usually small and productivity is limited.

Different types of diamond thin-film deposition equipment have their own advantages and disadvantages, and as an experienced deposition equipment manufacturer, we recommend that the choice be weighed according to specific needs and application scenarios.

For example, a factory may prefer MPCVD equipment if they are looking for high quality films.

We hope this article will give you a clearer understanding of their performance differences!