An introduction to the application of microwave plasma chemical vapour deposition equipment in the p

Microwave plasma chemical vapour deposition (MPCVD) equipment has a wide range of applications in materials preparation, especially in the synthesis of diamond and other high quality materials. The following is about the specific application of microwave plasma CVD equipment in material preparation:

I. Diamond Preparation

Principle of MPCVD preparation of diamond: MPCVD equipment generates microwaves through a microwave generator, and the microwaves are introduced into the reactor with a waveguide. A gas mixture of CH4 and H2 is fed into the reactor, and the microwave excitation generates a glow discharge in the reaction chamber, which dissociates the molecules of the reaction gas and generates plasma. The high-energy electrons and ions in the plasma collide with the gas molecules to promote the chemical reaction, which results in the deposition of a diamond film on the substrate.

Features of diamond preparation by MPCVD: MPCVD technology is capable of preparing large-area, high-quality diamond, and is considered to be the most ideal method for preparing artificial diamond in the future. This technology has the advantages of high electron density, large concentration of generated atomic H, and no electrode contamination. It is able to produce stable plasma under higher pressure, and the quality of the grown diamond film is higher.

Application areas: diamond film has a wide range of applications in optical, electronic, thermal and mechanical fields, such as missile cowls, optical infrared windows. The processed diamond film can be used as diamonds and other decorative items, and its price is only about a quarter of that of natural diamonds.

Second, the preparation of other high-quality materials

AlN film preparation: MPCVD technology can be used to produce high-quality AlN film at high temperatures. Compared to traditional epitaxial layer deposition methods (e.g. MOCVD and MBE), MPCVD does not use ammonia as a nitrogen source, avoiding the drawbacks of ammonia (e.g. toxicity, corrosiveness and pre-reactivity). The crystal quality and properties of AlN thin films can be further improved by optimising the growth conditions, e.g. by increasing the growth temperature and chamber pressure.

Other applications: MPCVD technology can also be used to prepare other high-quality materials such as gallium nitride, cadmium sulphide and other optical materials. By controlling the precursor material and reaction conditions, films with specific optical properties can be obtained to meet the needs of optoelectronic devices and optical sensors and other fields.

In short, microwave plasma CVD equipment has a wide range of application prospects in the field of material preparation. Its unique preparation principle and technical characteristics make MPCVD technology capable of preparing high-quality, large-area materials, especially outstanding in the synthesis of diamond and other high-quality materials. With the continuous development and optimisation of the technology, MPCVD equipment will be applied in more fields.